Last edited by Akira
Wednesday, April 29, 2020 | History

6 edition of Advances in resist technology and processing VIII found in the catalog.

Advances in resist technology and processing VIII

4-5 March, 1991, San Jose, California

by

  • 368 Want to read
  • 16 Currently reading

Published by SPIE in Bellingham, Wash., USA .
Written in English

    Subjects:
  • Photoresistors -- Congresses,
  • Photoresists -- Congresses,
  • Photolithography -- Congresses

  • Edition Notes

    Includes bibliographical references and index.

    StatementHiroshi Ito, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
    GenreCongresses.
    SeriesProceedings / SPIE--the International Society for Optical Engineering -- v. 1466., Proceedings of SPIE--the International Society for Optical Engineering -- v. 1466.
    ContributionsIto, Hiroshi., Society of Photo-optical Instrumentation Engineers.
    The Physical Object
    Paginationxii, 679 p. :
    Number of Pages679
    ID Numbers
    Open LibraryOL19567406M
    ISBN 100819405655
    ISBN 109780819405654
    OCLC/WorldCa24150723

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Advances in resist technology and processing VIII Download PDF EPUB FB2

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Vol. [H Ito]. Author(s), "Title of Paper," in Advances in Resist Materials and Processing Te chnology XXVI, edited by Clifford L. Henderson, Proce edings of SPIE Vol.

(SPIE, Bellingham, W A, ) Article CID. Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes.

Hiroshi Ito, Klaas Schildknegt, Eugene A Mash. Proceedings of the Eighth Conference on Advances in Resist Technology and Processing VIII - San Jose, CA, USA Duration: Mar 4 → Mar 5 by: 1.

Optimization of optical properties of resist processes SPIE Vol. Advances in Resist Technology and Processing V/il () Advances in resist technology and processing VIII book SPIE Vol.

Advances in Resist Technology and Author: Tim Brunner. Volume is indexed by Thomson Reuters CPCI-S (WoS).This collection of 86 peer-reviewed papers covers all aspects of the use of ultra-clean technology Advances in resist technology and processing VIII book large-scale integration on semiconductors, and cleaning and contamination-control in both front-end-of-line (FEOL) and back-end-of.

Proc. SPIE.Advances in Resist Technology and Processing XX KEYWORDS: Copper, Silicon, Surface roughness, Atomic layer deposition, Transistors, Line edge roughness, Tantalum, Plasma, Back end of line, Front end of line. 11 Ionic Contamination and Analytical Techniques for Ionic Contaminants Beverly Newton Rohnert Park, CA, USA What is an Ion.

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Advances in Resist Technology and Processing VIII () / 2 Analysis of. A review of the chemistry associated with photoresists based on photochemical generation of carboxylic acids from diazoketones and strong Brönsted acids from aromatic onium salts is presented.

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